There are two photolithography systems: one with light source of wavelength λ₁ = 156 nm (System 1) and another with a light source of wavelength λ₂ = 325 nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System 1 and System 2 are L_min1 and L_min2 respectively, the ratio L_min1/L_min2 (correct to two decimal places) is ____________.